Scientists have developed a technique that allows them to visualize defects on the surface of graphene. The technique may ultimately help scientists develop a better understanding of graphene’s ...

Photo-induced force microscopy (PiFM) is a sophisticated nanoscale characterization approach that combines the elevated spatial resolution of atomic force microscopy (AFM) with infrared (IR) ...

October 26, 2012. Aegis Software announced that Sechan Electronics Inc., a contract manufacturing services company, chose Aegis’ Quality System as a replacement for Sechan's paper-based defect mapping ...

Electron-beam inspection is proving to be indispensable for finding critical defects at sub-5nm dimensions. The challenge now is how to speed up the process to make it economically palatable to fabs.

As device sizes continue to increase on devices at 2x nm design rule and beyond and high wafer stress is worsening due to multi-film stacking in the vertical memory process, we observe an increasing ...