Experts at the table, part 3: Mask making remains a challenge, but multi-beam will provide a boost. Bold predictions and what threatens Moore’s Law. Fujimura: The mask community will undergo an ...

The semiconductor industry began using multi-patterning technology to fabricate ICs at the 20-nm process node. When we got to 7 nm, the use of self-aligned multi-patterning (SAMP) techniques was ...

Semiconductor Engineering sat down to discuss lithography and photomask trends with Uday Mitra, vice president and chief technology officer for the Etch Business Unit at Applied Materials; Pawitter ...

Some foundries require cut shapes to be aligned with respect to each other or to another layer. As shown in Figure 6, the Calibre Multi-Patterning tool automatically aligns the cut shapes between ...